Tag Archives: ion source

New controller for IG2 sputter ion source package

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The RBD Instrument’s IG2 sputter ion source package is a very simple, low cost sputtering package that is based on the old Physical Electronics 04-161/162 ion source and 20-045 ion source controller. The beam voltage can be varied from 500 volts (lower on request) to 2kV.

There are quite a few of these packages in the field where users do not need anything other than simply sputter cleaning an area off the surface of their specimen. More powerful ion source packages have a variety of performance options and can cost as much as $300K.

Some of the parts needed to build the 32-165 IG2 2 kV ion source controller are no longer available. As a result, we have redesigned the 32-165 and are now providing its replacement, the 32-175. The 32-175 functionality will be the same as the 32-165 with one exception: we have removed the anode monitor feature and replaced it with an emission current meter. The new emission current meter makes it possible for the user to set the amount of filament current needed to obtain the highest possible ion current and to monitor the thermal stability of the ionizer. Just like the 32-165, the new 32-175 will be compatible with the PHI 04-161 and 04-162 ion sources in addition to the RBD 04-165 2 kV ion source.

If you need a low cost sputter ion source visit the RBD Instruments website for more information – RBD Instruments IG2

How to align the 04-303 ion gun

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This post explains how to align the Physical Electronics 04-303 ion gun typically found on PHI Auger electron spectroscopy and X-ray photoelectron spectroscopy systems. The alignment principles explained here will apply to just about any surface analysis ion source.

First, here is a video that explains all of the alignment methods:

Next, here is a link to a tech tip that explains the theory and operation of the 04-303 ion gun: 04-303 Ion Source Theory and Alignment

Finally, here is the basic operation and alignment taken from the tech tip:

04-303 Ion Gun Operation

Basic Operation:

1. On the 11-065, set the Emission/Pressure meter switch to Emission. Make sure that the scale switch is in the X1 (times one) position.

2. Press the Diff Pump Ion Gun button on the AVC remote, or manually pump the ion gun.

3. Slowly turn up the Emission knob until you have 25mA of emission current (X1 position).

4. Switch the Emission/Pressure meter switch to Pressure.

5. Slowly open the argon leak valve on the 04-303 ion gun until you have 15 mPa of pressure on the meter. This corresponds to approximately 2 x 10-8 torr when differentially pumped, and 2 x 10-7 torr when not differentially pumped.

You are now ready to sputter. When you turn the ion beam voltage on, the ion gun will be sputtering.

Alignment: Visual Method

This works in both ABS and SED image modes. SED mode is sometimes easier to work with.

1. Insert a SiO2 sample and position it to the focal point of the analyzer. Use 30o to 60o of tilt.

2. Get a low magnification image of the SiO2. Use a low electron beam voltage, such as 1.5kV in order to get the largest possible image size (the lowest possible magnification).

3. Set up the ion gun as discussed above. Set the condenser to 5.00 (the smallest spot size) and the objective to 3.40.

4. Turn on the ion gun beam voltage. If the electron beam current and the ion beam current are approximately the same value, the ion beam spot should be visible on the TV monitor.

5. Mechanically adjust the position of the ion gun (turn the thumb screws) to center the ion beam spot on the TV monitor. Adjust the OBJ for the smallest spot size.

For more information or to order a replacement ionizer for your 04-303 ion gun, visit our website at www dot rbdinstruments dot com