IG2 Sputter Ion Source Package

2 kV source and controller - perfect low cost solution for beam etching and sputter cleaning.

IG2 Source

The IG2 sputter ion package is the perfect solution for low cost ion beam etching and sputter cleaning of specimens for surface analysis, cleaning STM tips, general vacuum science and nano technology applications.

If you just want to clean the surface of your sample or STM tip, why pay more than you need to? This simple to operate and reliable sputter ion source and control comprise the lowest priced package on the market today! The IG2 can also operate with inert gases such as Argon as well as Oxygen.

All packages include a 1 Year Warranty

Base package: Model 04-165 2 kV Backfill Ion Source (7” standard, 9” optional), model 32-175 Ion Source Control (90 to 264 VAC input voltage), 15 ft. (4.6m) cable, and manual.
Optional accessories: XY alignment bellows (9” 04-162 required), custom length cable.

Complete configuration and ordering information...




IG2 Controller

Technical Information

PHI Compatibility

The RBD 04-165 Ion Source is interchangeable with the PHI 04-161 and 04-162 ion sources.
The RBD 32-175 Ion Source Control is interchangeable with the PHI 20-045 control.
As a result, the RBD 04-165 works with the PHI 20-045, and the PHI 04-161 and 04-162 ion sources work with the RBD 32-175.

Working Distance

Typically 25-50 mm from end-of-optics to target.

IG2 Source Drawing


Theory of Operation

The 04-165 Backfill Ion Source generates an energetic inert gas ion beam for sputter-etching solid surfaces. The source requires a static pressure of 5x10-5 torr with an inert gas such as argon (see datasheet for list of compatible gasses). Ions are generated by electron impact within the ion source’s dual filament ionization chamber and are then focused at the target with energies of up to 2 kV. The impurity content of the ion beam is minimized by using an off-axis filament geometry. A focusing lens permits high ion current density to be obtained for a given operating pressure and source-to-sample distance. A dual tungsten filament assembly permits continued operation when the first filament opens. The expected lifetime of the filament assembly is several years under normal usage at the recommended operating conditions. The filament assembly is easily replaced in the field.

The Model 32-175 2 kV Ion Source Control provides all the necessary voltages and currents required to operate the 04-165 2 kV Backfill Ion Source. The beam voltage may be activated manualy or remotely. Additionally, the emission current may be monitored in order to appropriately set the filament current.    .


Application Notes and Whitepapers


Ordering Information

Request Quote / Info

Part Number Description
IG2PKGPR Includes 32-175 controller, standard 7" length 04-165 2kV ion source, 15 ft. (4.6 meter) cable, and manual.
Input voltage is 120V or 240V, please specify.
IG2PKGEXTPR Includes 32-175 controller, extended 9.25" length 04-165 2kV ion source, 15 ft. (4.6 meter) cable, and manual.
Input voltage is 120V or 240V, please specify.
32175PR 32-175 Ion Source Control (for IG2)
04165PR 04-165 Ion Source only, 7" length
04165XPR 04-165 Ion Source only, 9.25" length
04165CPR 04-165 Ion Source, Custom Length
IG2-EAPR XY Equipment Aligment bellows for 04-165 Ion Sources
SUB-IG2-CA1 Control Control Cable from RBD 32-165 to RBD 04-165; 15 feet (4.6 meters)
SUB-IG2-CA2 Control Cable from RBD 32-175 Ion Source Control to PHI 04-161/162 Ion Source; 15 feet (4.6 meters)
SUB-IG2-CA3 Control Cable from PHI 20-045 Control to RBD 04-165 Ion Source; 15 feet (4.6 meters)
SUB-IG2-CA4 Control Cable from RBD 32-175 to RBD 04-165; custom length up to 25 feet (7.6 meters)



Replacement parts and filaments are available for the IG2:

  • Screen, extractor cap / ionizer grid (04-165-MD15)
  • Ceramic kit (04165CSPR)
  • Ionizer assembly (04165IAPR)
  • 04-165 Dual Filament Kit (04165FKPR)
    Includes: 1- Filament Assembly (includes 2 filaments); 3- Ceramic washers; 3" Nickel wire; 1- Hex tool

Contact RBD for price and availability


Filament Change Procedure

Manual (32-165 Controller)