RBD's low cost sputter ion source package - the IG2 - is the ideal solution for sputter cleaning of samples under UHV conditions. The IG2 Ion Source Package consists of the Model 04-165 2 kV Backfill Ion Source and the Model 32-175 Ion Source Control. These units are interchangeable with the PHI 04-161 and 04-162 ion sourcess and the PHI 20-045 control, respectively.
RBD provices a 3 kV ion source sputter package that comprises an electron discharge source, power supply, and cable. Designed to operate as low as 100 eV, the 3 kV ion source provides a large 10 mm spot size and is compatible with all inert gasses and does not require differential pumping.
The package includes ion source, electronic control unit, sample current meter, cabling, operating manual and a spare filament assembly.
The Model 1401 Ion Source is ideal for use in surface chemistry experiments such as sample preparation and depth profiling with Auger and XPS. It can be used with most inert gasses.
The Model 1402 Ion Source features high beam currents at very low beam energies.
It also may be operated at high beam energies (up to 3 keV) to provide additional depth profiling and sample cleaning capability
The Model 1407 Ion Source features Duoplasmatron performance in an electron impact ionization ion source. By means of changeable apertures in the optics column, a wide range of beam currents and spot sizes may be obtained. At a beam energy of 5 keV, beam current may be adjusted from 2 uA into a 20 um diameter spot to 20 uA into a 100 um diameter spot.