RBD has released Version 1 of CMapp – the data collection, analysis and control application for the microCMA. Of course, this is not the first version of CMapp available, but we had a set of features in mind for Version 1 that would truly represent the most feature-complete version of CMapp. Of course, this won’t be the last version – we’re already busy adding new features and working on a completely redesigned application for a future release.
Download the latest version here.
Electron Gun Control Pane
The key new feature in CMapp 1.0 is the addition of the Electron Gun Control Pane, which replaces the dialog window. All of the electron gun controls are always available on-screen in the familiar layout. There’s no longer a need to move or minimize a window in order to view acquisition data.
Other Features and Changes
CMapp now offers the ability to differentiate and smooth data while acquiring. This is invaluable for getting important peak information in real-time, and removes the need to wait until the end of an acquisition to determine if the parameters are resulting in useful / expected data.
The latest version of CMapp also includes the ability of the edit the Wehnelt setpoints in the Hardware properties menu. Normally these values are factory set, but now they are easier to adjust without putting undo “stress” on the filament by ramping the beam voltage from 2 to 3 kV before having ballpark Wehnelt values.
Lastly, some minor changes have been made to improve the UI when working with Windows 11.