IG2 Sputter Ion Source Package
The IG2 sputter ion source package is the perfect solution for low cost ion beam etching and sputter cleaning of specimens for surface analysis, cleaning STM tips, general vacuum science and nano technology applications.
If you just want to clean the surface of your sample or STM tip, why pay more than you need to? This simple to operate and reliable sputter ion gun and control comprise the lowest priced package on the market today! The IG2 can also operate with inert gases such as Argon as well as Oxygen.
All packages include a 1 Year Warranty
Base package:2 kV Backfill Ion Source, Ion Source Control, cables and manual.
Optional accessories: Gas Admission: leak valve, Alignment: X-Y bellows
Replacement filaments and ionizer assemblies are also available
(including the new Dual Filament Kit)
More information... or call us at 541 550 5016
The RBD 04-165 Ion Source is interchangeable with the PHI 04-161 and 04-162 ion guns. The RBD 32-165 Ion Source Control is interchangeable with the PHI 20-045 control. As a result, the RBD Model 04-165 works with the PHI 20-045, and the PHI 04-161 and 04-162 ion guns work with the RBD Model 32-165.
The Model 04-165 Backfill Ion Source generates an energetic inert gas ion beam for sputter-etching solid surfaces. The source requires a static pressure of 5x10-5 torr with an inert gas such as argon (see datasheet for list of compatible gasses). Ions are generated by electron impact within the ion source’s dual filament ionization chamber and are then focused at the target with energies of up to 2 kV. The impurity content of the ion beam is minimized by using an off-axis filament geometry. A focusing lens permits high ion current density to be obtained for a given operating pressure and source-to-sample distance. A dual tungsten filament assembly permits continued operation when the first filament opens. The expected lifetime of the filament assembly is several years under normal usage at the recommended operating conditions. The filament assembly is easily replaced in the field.
The Model 32-165 2 kV Ion Source Control provides all the necessary voltages and currents required to operate the Model 04-165 2 kV Backfill Ion Source. The beam voltage may be activated manually, remotely, or with the built-in timer. Additionally, the anode (ion) and filament currents, as well as the beam and focus voltages, may be externally monitored to ensure accurate reproduction of sputtering conditions.