{"id":365,"date":"2019-06-19T07:55:47","date_gmt":"2019-06-19T14:55:47","guid":{"rendered":"http:\/\/www.rbdinstruments.com\/blog\/?p=365"},"modified":"2023-12-07T16:01:23","modified_gmt":"2023-12-08T00:01:23","slug":"sputter-rate-standard","status":"publish","type":"post","link":"https:\/\/www.rbdinstruments.com\/blog\/sputter-rate-standard\/","title":{"rendered":"Sputter rate standard"},"content":{"rendered":"

Why do you need sputter rate standards anyway? Each ion source will produce a different sputter rate depending on the conditions that the ion source is operated at, as well as other factors such as the angle of the ion source to the sample. Changing the beam voltage, condenser and focus (beam size), pressure (amount of argon or other gas) and raster area all affect the sputter rate. By using a sputter rate standard you can characterize your ion source for a particular set of operating conditions for a known oxide layer thickness of standard material (Ta2O5 or SiO2).<\/p>\n

To further complicate things, the sputter rate of different materials varies greatly and that makes it very difficult to accurately know the true sputter rate for compounds and multi layer samples.<\/p>\n

The link to this SPECs article for some very helpful insights into sputter rates on different materials:<\/p>\n

Sputter Rate Information<\/a><\/p>\n

And, here is a link to a PNNL publication<\/a> on the sputter rates of oxide films relative to SiO2.<\/p>\n

TaO5 sputter rate standard<\/strong><\/p>\n

RBD Instruments provides a 1000 Angstrom oxide layer TaO5 sputter rate standard which is approximately .75 X .50 inch in size.\u00a0 Both sides of the standard can be used, so one standard can last a long time.\u00a0\u00a0 The RBD part number is TA2O5RE.<\/p>\n

SiO2 sputter rate standard<\/strong><\/p>\n

RBD Instruments\u00a0 provides a 1000 Angstrom oxide layer SiO2 sputter rate standard which is approximately .50 X .50 inch in size and comes in a two pack.\u00a0 The RBD part number is SIO2CALRE\u00a0 and like the TaO5 standard, both sides can be used.<\/p>\n

To request a quote for either standard, contact RBD here<\/a>.<\/p>\n","protected":false},"excerpt":{"rendered":"

Why do you need sputter rate standards anyway? Each ion source will produce a different sputter rate depending on the conditions that the ion source is operated at, as well as other factors such as the angle of the ion … Continue reading →<\/span><\/a><\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"jetpack_post_was_ever_published":false,"_jetpack_newsletter_access":"","footnotes":"","jetpack_publicize_message":"","jetpack_is_tweetstorm":false,"jetpack_publicize_feature_enabled":true,"jetpack_social_post_already_shared":false,"jetpack_social_options":{"image_generator_settings":{"template":"highway","enabled":false}}},"categories":[161],"tags":[279,56,57,278],"jetpack_publicize_connections":[],"jetpack_featured_media_url":"","jetpack_shortlink":"https:\/\/wp.me\/p2DEXo-5T","jetpack_sharing_enabled":true,"jetpack_likes_enabled":true,"jetpack-related-posts":[{"id":1597,"url":"https:\/\/www.rbdinstruments.com\/blog\/pm-sequence-on-xps-and-aes-systems\/","url_meta":{"origin":365,"position":0},"title":"PM sequence on XPS and AES systems","author":"Randy","date":"December 6, 2015","format":false,"excerpt":"Performing regular Preventive Maintenance on surface analysis systems such as X-ray Photo Electron spectrometers (XPS) and Auger Electron spectrometers (AES) is a very important step in keeping the systems functioning properly and reliably. But performing the necessary steps in the correct PM sequence will make sure that you maximize the\u2026","rel":"","context":"In "Operation and Calibration Procedures"","block_context":{"text":"Operation and Calibration Procedures","link":"https:\/\/www.rbdinstruments.com\/blog\/category\/operation-and-calibration-procedures\/"},"img":{"alt_text":"electronics console air filters","src":"https:\/\/i0.wp.com\/www.rbdinstruments.com\/blog\/wp-content\/uploads\/2012\/11\/GMBH-filters.jpg?fit=704%2C470&ssl=1&resize=350%2C200","width":350,"height":200,"srcset":"https:\/\/i0.wp.com\/www.rbdinstruments.com\/blog\/wp-content\/uploads\/2012\/11\/GMBH-filters.jpg?fit=704%2C470&ssl=1&resize=350%2C200 1x, https:\/\/i0.wp.com\/www.rbdinstruments.com\/blog\/wp-content\/uploads\/2012\/11\/GMBH-filters.jpg?fit=704%2C470&ssl=1&resize=700%2C400 2x"},"classes":[]},{"id":1069,"url":"https:\/\/www.rbdinstruments.com\/blog\/ion-source-filament-assembly-phi-04-303-06-350\/","url_meta":{"origin":365,"position":1},"title":"Ion source filament assembly for PHI 04-303, 06-350 and FIG 5 ion sources","author":"Randy","date":"May 23, 2014","format":false,"excerpt":"RBD Instruments\u2019 proprietary technique for rebuilding the PHI 04-303 ion gun and 06-350 ion source filament assembly results in more stable sputter rates and longer filament lifetimes than other ionizers. The pictures below are actual 04-303 ion source filament assemblies which show the visible light emitting from the filaments. Note\u2026","rel":"","context":"In "Ion Sources"","block_context":{"text":"Ion Sources","link":"https:\/\/www.rbdinstruments.com\/blog\/category\/ion-sources\/"},"img":{"alt_text":"ion-source-filament","src":"https:\/\/i0.wp.com\/www.rbdinstruments.com\/blog\/wp-content\/uploads\/2014\/05\/3-post-ionizer.jpg?fit=640%2C480&ssl=1&resize=350%2C200","width":350,"height":200},"classes":[]},{"id":371,"url":"https:\/\/www.rbdinstruments.com\/blog\/faraday-cup-procedure-to-align-ion-beam-current\/","url_meta":{"origin":365,"position":2},"title":"Faraday cup procedure to align ion beam current","author":"Randy","date":"March 11, 2013","format":false,"excerpt":"Using Ta2O5 or SiO2 works well for aligning an ion beam to the focal point of an X-ray photoelectron or scanning Auger electron spectrometer. But, in order to optimize the ion beam focus at larger beam sizes, a Faraday cup is required. The Faraday cup used on many Physical Electronics\/PHI\u2026","rel":"","context":"In "Ion Sources"","block_context":{"text":"Ion Sources","link":"https:\/\/www.rbdinstruments.com\/blog\/category\/ion-sources\/"},"img":{"alt_text":"faraday cup","src":"https:\/\/i0.wp.com\/www.rbdinstruments.com\/blog\/wp-content\/uploads\/2013\/03\/faraday-cup-254x300.jpg?resize=350%2C200&ssl=1","width":350,"height":200},"classes":[]},{"id":4195,"url":"https:\/\/www.rbdinstruments.com\/blog\/new-controller-for-ig2-sputter-ion-source-package\/","url_meta":{"origin":365,"position":3},"title":"New controller for IG2 sputter ion source package","author":"Randy","date":"May 5, 2025","format":false,"excerpt":"The RBD Instruments 32-175 controller is used with the 04-165 source as part of the IG2 2kV sputter ion source package.","rel":"","context":"In "Ion Sources"","block_context":{"text":"Ion Sources","link":"https:\/\/www.rbdinstruments.com\/blog\/category\/ion-sources\/"},"img":{"alt_text":"","src":"https:\/\/i0.wp.com\/www.rbdinstruments.com\/blog\/wp-content\/uploads\/2025\/05\/32-175-picture.jpg?fit=1200%2C513&ssl=1&resize=350%2C200","width":350,"height":200,"srcset":"https:\/\/i0.wp.com\/www.rbdinstruments.com\/blog\/wp-content\/uploads\/2025\/05\/32-175-picture.jpg?fit=1200%2C513&ssl=1&resize=350%2C200 1x, https:\/\/i0.wp.com\/www.rbdinstruments.com\/blog\/wp-content\/uploads\/2025\/05\/32-175-picture.jpg?fit=1200%2C513&ssl=1&resize=700%2C400 2x, https:\/\/i0.wp.com\/www.rbdinstruments.com\/blog\/wp-content\/uploads\/2025\/05\/32-175-picture.jpg?fit=1200%2C513&ssl=1&resize=1050%2C600 3x"},"classes":[]},{"id":992,"url":"https:\/\/www.rbdinstruments.com\/blog\/ion-pump-rejuvenation-procedure\/","url_meta":{"origin":365,"position":4},"title":"Ion Pump Rejuvenation Procedure","author":"Randy","date":"March 12, 2014","format":false,"excerpt":"After prolonged periods of sputtering with Argon gas, the ion pumps can become saturated, resulting in occasional \"belches\" of Argon during which the ion pumps overheat and release large amounts of gas. These belches usually result in a snowball effect that can dump the system. Rejuvenating the ion pumps once\u2026","rel":"","context":"In "General Optics and Vacuum"","block_context":{"text":"General Optics and Vacuum","link":"https:\/\/www.rbdinstruments.com\/blog\/category\/general-optics-and-vacuum\/"},"img":{"alt_text":"","src":"https:\/\/i0.wp.com\/www.rbdinstruments.com\/blog\/wp-content\/uploads\/2014\/03\/Ion-pump.jpg?fit=243%2C207&ssl=1&resize=350%2C200","width":350,"height":200},"classes":[]},{"id":231,"url":"https:\/\/www.rbdinstruments.com\/blog\/how-to-align-the-04-303-ion-gun\/","url_meta":{"origin":365,"position":5},"title":"How to align the 04-303 ion gun","author":"Randy","date":"November 29, 2012","format":false,"excerpt":"This post explains how to align the Physical Electronics 04-303 ion gun typically found on PHI Auger electron spectroscopy and X-ray photoelectron spectroscopy systems. The alignment principles explained here will apply to just about any surface analysis ion source. 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