PHI VersaProbe operation

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PHI VersaProbe operation

The following links offer a variety of operating procedures for the PHI VersaProbe XPS system.

Yale Materials Science

Stanford Versaprobe III Operation

PHI’s latest Versaprobe (the Versaprobe III) has improved performance and features including –

  • New Analyzer input lens with 2-3 times higher sensitivity for all analysis conditions
  • New Multi-channel detector for faster elemental and chemical imaging
  • New Angle dependent technology for +/- 5 degree solid angle collection for ADXPS measurements
  • Improved Hot/cold stage providing temperatures of -140° C to +600° C
  • New Dedicated hot sample platen operating up to 800° C
  • New 4-contact transferable sample mount for in-situ controlled potential experiments
  • New UPS design for increased sensitivity and improved energy resolution
  • Improved Auger performance providing higher energy resolution and better signal to noise

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