PHI 5600 LS XPS System

$ 155,000.00 Includes installation and training in the continental U.S. and a one year warranty.

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5600LSXPS

 

Brief Description:

Monoenergetic x-rays are focused onto the surface of a material and excite surface atoms.
Core and valence shell photoelectrons with energies characteristic of elements in the top 100 Å are ejected and energy analyzed to obtain qualitative and quantitative information on surface composition. The kinetic energy of the electron emitted provides information about the functional group and the oxidation state of the surface species.

Type of Information Obtained:

All elements except hydrogen and helium can be detected. Detection limits are element-specific and are typically ~0.1-1.0 atomic percent. It should be recognized that low-concentration bulk components (ppm) that migrate to a surface may be easily detected if the surface concentration exceeds the detection limit in the outermost 100 Å. The XPS experiment is performed in ultrahigh vacuum, so samples should be vacuum-compatible. Solids, films, powders, and fibers can be analyzed. Thin samples up to 8 inches in diameter can be studied intact. Proper handling of the sample before analysis is critical, because contamination must be avoided (fingerprints can completely mask the surface of interest).

Examples of Uses:

System Specifications

The system is composed of seven major subsystems: the vacuum system and associated electronics; the integrated console; the x-ray generator; the analyzer-detector and associated electronics; the computer electronics; the sample manipulation system electronics and sample processing hardware; and the sputtering system.

The vacuum system is all UHV construction with a 220-liter per second ion pump and a titanium sublimation pump. The sample introduction system allows a sample platen to be introduced into the vacuum system. A mechanical and turbo molecular pump provides introduction system pumping. Valve sequencing and pumping can be controlled manually or with the automated Auto Valve Control.

The system has two x-ray sources; a standard dual anode and an aluminum monochromator.

A closed cycle heat exchanger deionizer unit provides x-ray source cooling. It has a flow rate indicator which is interlocked with the x-ray source electronics so that if the coolant flow stops, the x-ray source turns off.

Electron energy analysis is provided by a 180° spherical capacitor analyzer. The analyzer is composed of two concentric hemispheres, which are surrounded by a magnetic shield. The electrons are detected by a multi-channel detector (a 16 position channel plate detector).

Instrument control, data acquisition and data reduction are provided by a Dell Pentium computer operating under Windows XP.  The acquisition and data massage software provide automation of all sample positioning and analysis parameters. Operator-defined settings allow the operator to recall frequently used analysis settings. The operator can perform data analysis and reduction while data acquisition is occurring. Further, the system can operate in an automated mode to improve the system efficiency. Advanced data reduction can also be done through use of the CasaXPS software package.

The large sample manipulator (a base multi-sample platen) can position a single sample up to eight inches in diameter, up to one inch thick, and up to five pounds in weight; up to 100 smaller samples; or a combination of intermediate sized samples. For angle resolve XPS, the LS system has a specially designed platen that permits data acquisition of photoelectron take-off angles from 10° to 90°. Computer control of sample positioning (stage movement along x, y, and z axis as well as tilt and rotation under automated control) allows the operator to select and program up to 100 analysis positions. A microscope, color camera, and monitor are used to align the sample and locate specific regions for analysis.

A variable intensity, flange-mounted light source is used to illuminate the sample during sample alignment. The analysis area is selected by an externally adjustable five-position aperture (Variable; 0.8 x 2 mm to 75 µm ) and by computer-controlled analyzer lens voltages.

A sputter ion gun is provided and used for the removal of surface contamination and for XPS composition depth profiling capability.

The LS system has been under service contract during its entire lifetime including yearly preventative maintenance visits. All manuals that came with the instrument are included.

Complete Technical Specifications

Data Acquisition Modes

Survey, multiplex, depth profile, angle resolved

 

 

Analysis Area

 

Analysis Area

Variable; 0.8 x 2 mm to 75 µm diameter

Resolution.

0.48 - 1.40 eV

 

 

Sample Dimensions, Stage

 

Maximum Sample Width

8 in (20.32 cm)

Maximum Sample Height.

1 in (25 mm)

Maximum Sample Weight

5 lbs (2.3 kg)

Stage

5-axis computer controlled

 

 

Precision Energy Analyzer

 

Type

Spherical Capacitor Analyzer (SCA)

Lens

Omni-Focus™ III

Detector.

Multi-Channel Detector

 

 

Analyzer Electronics

 

Energy

 

      Scan Range

0 to 4800 eV

      Resolution

0.025 eV minimum step size

Pass Energy (Fixed Analyzer Transmission Mode)

 

      Range

0 to 200 eV

 

 

Monochromatic X-Ray Source

 

Energy Range

Variable; 4 kV to 15 kV

Anode Material

Al

Power

300 W in continuous operation

 

 

Dual Anode X-Ray Source

 

Energy Range

Variable; 4 kV to 15 kV

Anode Material

Side 1 – Mg, Side 2 – Al

Power

Maximum 400 W during single anode operation

 

 

Ion Gun

 

Source Type

Electron Impact

Beam Voltage

Variable, up to 5 kV

Maximum Beam Current

5 µA

Beam Current Density

600 µA/cm2 at 5.0 cm from gun

Beam Diameter

Variable, 800 µm to 200 µm at 5.0 cm from gun

Raster

Independent x and y rastering, maximum 10mm by 10mm centered on static beam position

Gas

Argon

Differential Pumping

< 7 x 10-8 Torr in test chamber while sputtering with turbo molecular pump

 

 

 

 

Vacuum System

 

Base Pressure

. ≤ 5 x 10-10 Torr